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The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis Under Thermal Annealing

Yıl 2022, Cilt: 10 Sayı: 4, 1026 - 1036, 30.12.2022
https://doi.org/10.29109/gujsc.1137863

Öz

Impact of annealing on structural, morphological, elemental, and optical properties of bilayer ZnO/Al2O3 film has been investigated. Bilayer film has been deposited on microscope slides by ultrasonic spray pyrolysis method at 350°C substrate temperature. Then, this film has been annealed at 400°C, 500°C, and 600°C under atmospheric conditions, respectively. Structural analyses have been revealed that bilayer films have polycrystalline with hexagonal wurtzite structures of ZnO. Also, there is no other structures have been found like Zn-Al etc. Morphological and elemental analyses have been presented that the alterations of surface, and diffusions of Al to ZnO layer. Cross-sectional images have been revealed the film thickness between 0,78-1.56 m. Optical method have been used for calculation of optical band gap values of the films which are found between 3.17-3.25 eV. The results revealed that annealing leads to diffusion from the bottom layer Al2O3 of the material to the upper layer, ZnO. In addition, it was determined that the as-deposited ZnO/Al2O3 film is still leading in terms of the investigated properties.

Kaynakça

  • [1] Rowlette, P. C., Wolden, C. A., Pulsed plasma-enhanced chemical vapor deposition of Al2O3–TiO2 nanolaminates, Thin Solid Films, 518(3337-3341), (2010).
  • [2] Khan, M. I., Imran, S., Saleem, M., Rehman, S. U., Annealing effect on the structural, morphological and electrical properties of TiO2/ZnO bilayer thin films. Results in physics, 8(249-252), (2018).
  • [3] Besleaga, C., Stan, G. E., Galca, A. C., Ion, L., Antohe, S., Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate. Applied surface science, 258(8819-8824) (2012).
  • [4] Yadav, H. M., and Kim, J. S., Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties. Journal of Materials Science: Materials in Electronics, 27(10082-10088) (2016).
  • [5] Lin, C. Y., Chen, J. G., Feng, W. Y., Lin, C. W., Huang, J. W., Tunney, J. J., Ho, K. C., Using a TiO2/ZnO double-layer film for improving the sensing performance of ZnO based NO gas sensor. Sensors and Actuators B: Chemical, 157(361-367) (2011).
  • [6] Ding, K., Zhang, X., Ning, L., Shao, Z., Xiao, P., Ho-Baillie, A., ... and Jie, J., Hue tunable, high color saturation and high-efficiency graphene/silicon heterojunction solar cells with MgF2/ZnS double anti-reflection layer. Nano Energy, 46(257-265), (2018).
  • [7] Kanda, H., Uzum, A., Harano, N., Yoshinaga, S., Ishikawa, Y., Uraoka, Y., ... and Ito, S., Al2O3/TiO2 double layer anti‐reflection coating film for crystalline silicon solar cells formed by spray pyrolysis. Energy Science & Engineering, 4(269-276), (2016).
  • [8] Mahadik, M. A., Shinde, S. S., Mohite, V. S., Kumbhar, S. S., Moholkar, A. V., Rajpure, K. Y., ... and Bhosale, C. H., Visible light catalysis of rhodamine B using nanostructured Fe2O3, TiO2 and TiO2/Fe2O3 thin films. Journal of Photochemistry and Photobiology B: Biology, 133(90-98), (2014).
  • [9] Polyakov, B., Kuzmin, A., Vlassov, S., Butanovs, E., Zideluns, J., Butikova, J., ... and Zubkins, M., A comparative study of heterostructured CuO/CuWO4 nanowires and thin films. Journal of Crystal Growth, 480 (78-84), (2017).
  • [10] Viter, R., Iatsunskyi, I., Fedorenko, V., Tumenas, S., Balevicius, Z., Ramanavicius, A., ... and Bechelany, M., Enhancement of electronic and optical properties of ZnO/Al2O3 nanolaminate coated electrospun nanofibers. The Journal of Physical Chemistry C, 120(5124-5132), (2016).
  • [11] Elam, J. W., Sechrist, Z. A., George, S. M., ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements, Thin Solid Films, 414(43-55), (2002).
  • [12] Martínez-Castelo, J. R., López, J., Domínguez, D., Murillo, E., Machorro, R., Borbón-Nuñez, H. A., ... and Tiznado, H., Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition. Materials Science in Semiconductor Processing, 71 (290-295), (2017).
  • [13] Ahn, C. H., Kim, S. H., Kim, Y. K., Lee, H. S., and Cho, H. K., Effect of post-annealing temperatures on thin-film transistors with ZnO/Al2O3 superlattice channels. Thin Solid Films, 584 (336-340) (2015).
  • [14] Tüzemen, E. Ş., Özer, A., Demir, İ., Altuntaş, İ., Şimşir, M., ZnO/Al2O3 layered structures deposited by RF magnetron sputtering on glass: growth characteristics, optical properties, and microstructural analysis. Journal of the Australian Ceramic Society, 57(1379-1388) (2021).
  • [15] Zahid, M. A., Khokhar, M. Q., Park, S., Hussain, S. Q., Kim, Y., and Yi, J., Influence of Al2O3/IZO double-layer antireflective coating on the front side of rear emitter silicon heterojunction solar cell. Vacuum, 200(110967), (2022).
  • [16] Purica, M., Budianu, E., Rusu, E., Danila, M. A., and Gavrila, R., Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD). Thin Solid Films, 403(485-488), (2002).
  • [17] Di Mauro, A., Fragala, M. E., Privitera, V., and Impellizzeri, G., ZnO for application in photocatalysis: From thin films to nanostructures. Materials Science in Semiconductor Processing, 69(44-51), (2017).
  • [18] Kaneva, N. V., Dushkin, C. D., Preparation of nanocrystalline thin films of ZnO by sol-gel dip coating. Bulg Chem Commun, 43(259-263), (2011).
  • [19] Polat Gönüllü, M. The Effect of Annealing Technique on ZnO Film Properties. Gazi University Journal of Science, 35(618-629), (2022).
  • [20] Pradhan, S. K., Reucroft, P. J., Ko, Y., Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition. Surface and Coatings Technology, 176(382-384), (2004).
  • [21] Nalcaci, B., Polat Gonullu, M., Insight of mechanical and morphological properties of ALD-Al2O3 films in point of structural properties. Applied Physics A, 127(1-10) (2021).
  • [22] Ateş, H., Polat Gonullu, M., Atomik Katman Biriktirme Tekniğine Genel Bakış: ZnO, TiO2 ve Al2O3 Filmlerin Üretimi. Gazi University Journal of Science Part C: Design and Technology, 7/3 (649-660) (2019).
  • [23] Khazamipour, N., Kabiri-Ameri-Aboutorabi, S., Asl-Solaimani, E., The structural, electrical and optical properties of ZnO/Al2O3 multilayer deposited on PET substrates by RF sputtering. Renewable energy, 49(275-277), (2013).
  • [24] Cui, G., Han, D., Dong, J., Cong, Y., Zhang, X., Li, H., ... and Wang, Y., Effects of channel structure consisting of ZnO/Al2O3 multilayers on thin-film transistors fabricated by atomic layer deposition. Japanese Journal of Applied Physics, 56(4S), (2017) 04CG03.
  • [25] Chaaya, A. A., Viter, R., Baleviciute, I., Bechelany, M., Ramanavicius, A., Gertnere, Z., ... and Miele, P., Tuning optical properties of Al2O3/ZnO nanolaminates synthesized by atomic layer deposition. The Journal of Physical Chemistry C, 118(3811-3819), (2014).
  • [26] Gonullu, M. P., Design and characterization of single bilayer ZnO/Al2O3 film by ultrasonically spray pyrolysis and its application in photocatalysis. Superlattices and Microstructures, 164(107113), (2022).
  • [27] Patil, P. S., Versatility of chemical spray pyrolysis technique. Materials Chemistry and physics, 59(185-198), (1999).
  • [28] Gonullu, M. P., Kose, S., On the Role of High Amounts of Mn Element in CdS Structure. Metallurgical and Materials Transactions A, 48(1321-1329), (2017).
  • [29] Khan, M. I., Ali, A., Effect of laser irradiation on the structural, morphological and electrical properties of polycrystalline TiO2 thin films. Results in physics, 7(3455-3458), (2017).
  • [30] Garnier, J., Bouteville, A., Hamilton, J., Pemble, M. E., Povey, I. M., A comparison of different spray chemical vapour deposition methods for the production of undoped ZnO thin films. Thin Solid Films, 518(1129-1135), (2009).
  • [31] Bacaksiz, E., Parlak, M., Tomakin, M., Özçelik, A., Karakiz, M., Altunbaş, M., The effects of zinc nitrate, zinc acetate and zinc chloride precursors on investigation of structural and optical properties of ZnO thin films. Journal of Alloys and Compounds, 466(447-450), (2008).
  • [32] Jakschik, S., Schroeder, U., Hecht, T., Gutsche, M., Seidl, H., and Bartha, J. W., Crystallization behavior of thin ALD-Al2O3 films. Thin Solid Films, 425(216-220), (2003).
  • [33] Barrett, C. S., CS, B., and TB, M., Structure of metals, Crystallographic methods, principles and data, (1980).
  • [34] Callister, W. D., and Rethwisch, D. G., Materials science and engineering: an introduction (Vol. 9). (2018), New York: Wiley.
  • [35] Mamazza Jr, R., Morel, D. L., and Ferekides, C. S., Transparent conducting oxide thin films of Cd2SnO4 prepared by RF magnetron co-sputtering of the constituent binary oxides. Thin solid films, 484(26-33), (2005).
Yıl 2022, Cilt: 10 Sayı: 4, 1026 - 1036, 30.12.2022
https://doi.org/10.29109/gujsc.1137863

Öz

Kaynakça

  • [1] Rowlette, P. C., Wolden, C. A., Pulsed plasma-enhanced chemical vapor deposition of Al2O3–TiO2 nanolaminates, Thin Solid Films, 518(3337-3341), (2010).
  • [2] Khan, M. I., Imran, S., Saleem, M., Rehman, S. U., Annealing effect on the structural, morphological and electrical properties of TiO2/ZnO bilayer thin films. Results in physics, 8(249-252), (2018).
  • [3] Besleaga, C., Stan, G. E., Galca, A. C., Ion, L., Antohe, S., Double layer structure of ZnO thin films deposited by RF-magnetron sputtering on glass substrate. Applied surface science, 258(8819-8824) (2012).
  • [4] Yadav, H. M., and Kim, J. S., Fabrication of SiO2/TiO2 double layer thin films with self-cleaning and photocatalytic properties. Journal of Materials Science: Materials in Electronics, 27(10082-10088) (2016).
  • [5] Lin, C. Y., Chen, J. G., Feng, W. Y., Lin, C. W., Huang, J. W., Tunney, J. J., Ho, K. C., Using a TiO2/ZnO double-layer film for improving the sensing performance of ZnO based NO gas sensor. Sensors and Actuators B: Chemical, 157(361-367) (2011).
  • [6] Ding, K., Zhang, X., Ning, L., Shao, Z., Xiao, P., Ho-Baillie, A., ... and Jie, J., Hue tunable, high color saturation and high-efficiency graphene/silicon heterojunction solar cells with MgF2/ZnS double anti-reflection layer. Nano Energy, 46(257-265), (2018).
  • [7] Kanda, H., Uzum, A., Harano, N., Yoshinaga, S., Ishikawa, Y., Uraoka, Y., ... and Ito, S., Al2O3/TiO2 double layer anti‐reflection coating film for crystalline silicon solar cells formed by spray pyrolysis. Energy Science & Engineering, 4(269-276), (2016).
  • [8] Mahadik, M. A., Shinde, S. S., Mohite, V. S., Kumbhar, S. S., Moholkar, A. V., Rajpure, K. Y., ... and Bhosale, C. H., Visible light catalysis of rhodamine B using nanostructured Fe2O3, TiO2 and TiO2/Fe2O3 thin films. Journal of Photochemistry and Photobiology B: Biology, 133(90-98), (2014).
  • [9] Polyakov, B., Kuzmin, A., Vlassov, S., Butanovs, E., Zideluns, J., Butikova, J., ... and Zubkins, M., A comparative study of heterostructured CuO/CuWO4 nanowires and thin films. Journal of Crystal Growth, 480 (78-84), (2017).
  • [10] Viter, R., Iatsunskyi, I., Fedorenko, V., Tumenas, S., Balevicius, Z., Ramanavicius, A., ... and Bechelany, M., Enhancement of electronic and optical properties of ZnO/Al2O3 nanolaminate coated electrospun nanofibers. The Journal of Physical Chemistry C, 120(5124-5132), (2016).
  • [11] Elam, J. W., Sechrist, Z. A., George, S. M., ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition: growth and surface roughness measurements, Thin Solid Films, 414(43-55), (2002).
  • [12] Martínez-Castelo, J. R., López, J., Domínguez, D., Murillo, E., Machorro, R., Borbón-Nuñez, H. A., ... and Tiznado, H., Structural and electrical characterization of multilayer Al2O3/ZnO nanolaminates grown by atomic layer deposition. Materials Science in Semiconductor Processing, 71 (290-295), (2017).
  • [13] Ahn, C. H., Kim, S. H., Kim, Y. K., Lee, H. S., and Cho, H. K., Effect of post-annealing temperatures on thin-film transistors with ZnO/Al2O3 superlattice channels. Thin Solid Films, 584 (336-340) (2015).
  • [14] Tüzemen, E. Ş., Özer, A., Demir, İ., Altuntaş, İ., Şimşir, M., ZnO/Al2O3 layered structures deposited by RF magnetron sputtering on glass: growth characteristics, optical properties, and microstructural analysis. Journal of the Australian Ceramic Society, 57(1379-1388) (2021).
  • [15] Zahid, M. A., Khokhar, M. Q., Park, S., Hussain, S. Q., Kim, Y., and Yi, J., Influence of Al2O3/IZO double-layer antireflective coating on the front side of rear emitter silicon heterojunction solar cell. Vacuum, 200(110967), (2022).
  • [16] Purica, M., Budianu, E., Rusu, E., Danila, M. A., and Gavrila, R., Optical and structural investigation of ZnO thin films prepared by chemical vapor deposition (CVD). Thin Solid Films, 403(485-488), (2002).
  • [17] Di Mauro, A., Fragala, M. E., Privitera, V., and Impellizzeri, G., ZnO for application in photocatalysis: From thin films to nanostructures. Materials Science in Semiconductor Processing, 69(44-51), (2017).
  • [18] Kaneva, N. V., Dushkin, C. D., Preparation of nanocrystalline thin films of ZnO by sol-gel dip coating. Bulg Chem Commun, 43(259-263), (2011).
  • [19] Polat Gönüllü, M. The Effect of Annealing Technique on ZnO Film Properties. Gazi University Journal of Science, 35(618-629), (2022).
  • [20] Pradhan, S. K., Reucroft, P. J., Ko, Y., Crystallinity of Al2O3 films deposited by metalorganic chemical vapor deposition. Surface and Coatings Technology, 176(382-384), (2004).
  • [21] Nalcaci, B., Polat Gonullu, M., Insight of mechanical and morphological properties of ALD-Al2O3 films in point of structural properties. Applied Physics A, 127(1-10) (2021).
  • [22] Ateş, H., Polat Gonullu, M., Atomik Katman Biriktirme Tekniğine Genel Bakış: ZnO, TiO2 ve Al2O3 Filmlerin Üretimi. Gazi University Journal of Science Part C: Design and Technology, 7/3 (649-660) (2019).
  • [23] Khazamipour, N., Kabiri-Ameri-Aboutorabi, S., Asl-Solaimani, E., The structural, electrical and optical properties of ZnO/Al2O3 multilayer deposited on PET substrates by RF sputtering. Renewable energy, 49(275-277), (2013).
  • [24] Cui, G., Han, D., Dong, J., Cong, Y., Zhang, X., Li, H., ... and Wang, Y., Effects of channel structure consisting of ZnO/Al2O3 multilayers on thin-film transistors fabricated by atomic layer deposition. Japanese Journal of Applied Physics, 56(4S), (2017) 04CG03.
  • [25] Chaaya, A. A., Viter, R., Baleviciute, I., Bechelany, M., Ramanavicius, A., Gertnere, Z., ... and Miele, P., Tuning optical properties of Al2O3/ZnO nanolaminates synthesized by atomic layer deposition. The Journal of Physical Chemistry C, 118(3811-3819), (2014).
  • [26] Gonullu, M. P., Design and characterization of single bilayer ZnO/Al2O3 film by ultrasonically spray pyrolysis and its application in photocatalysis. Superlattices and Microstructures, 164(107113), (2022).
  • [27] Patil, P. S., Versatility of chemical spray pyrolysis technique. Materials Chemistry and physics, 59(185-198), (1999).
  • [28] Gonullu, M. P., Kose, S., On the Role of High Amounts of Mn Element in CdS Structure. Metallurgical and Materials Transactions A, 48(1321-1329), (2017).
  • [29] Khan, M. I., Ali, A., Effect of laser irradiation on the structural, morphological and electrical properties of polycrystalline TiO2 thin films. Results in physics, 7(3455-3458), (2017).
  • [30] Garnier, J., Bouteville, A., Hamilton, J., Pemble, M. E., Povey, I. M., A comparison of different spray chemical vapour deposition methods for the production of undoped ZnO thin films. Thin Solid Films, 518(1129-1135), (2009).
  • [31] Bacaksiz, E., Parlak, M., Tomakin, M., Özçelik, A., Karakiz, M., Altunbaş, M., The effects of zinc nitrate, zinc acetate and zinc chloride precursors on investigation of structural and optical properties of ZnO thin films. Journal of Alloys and Compounds, 466(447-450), (2008).
  • [32] Jakschik, S., Schroeder, U., Hecht, T., Gutsche, M., Seidl, H., and Bartha, J. W., Crystallization behavior of thin ALD-Al2O3 films. Thin Solid Films, 425(216-220), (2003).
  • [33] Barrett, C. S., CS, B., and TB, M., Structure of metals, Crystallographic methods, principles and data, (1980).
  • [34] Callister, W. D., and Rethwisch, D. G., Materials science and engineering: an introduction (Vol. 9). (2018), New York: Wiley.
  • [35] Mamazza Jr, R., Morel, D. L., and Ferekides, C. S., Transparent conducting oxide thin films of Cd2SnO4 prepared by RF magnetron co-sputtering of the constituent binary oxides. Thin solid films, 484(26-33), (2005).
Toplam 35 adet kaynakça vardır.

Ayrıntılar

Birincil Dil İngilizce
Konular Mühendislik
Bölüm Tasarım ve Teknoloji
Yazarlar

Meryem Polat Gönüllü 0000-0002-9503-227X

Damla Dilara Çakıl 0000-0002-0100-9993

Cemil Çetinkaya 0000-0002-0298-1143

Yayımlanma Tarihi 30 Aralık 2022
Gönderilme Tarihi 30 Haziran 2022
Yayımlandığı Sayı Yıl 2022 Cilt: 10 Sayı: 4

Kaynak Göster

APA Polat Gönüllü, M., Çakıl, D. D., & Çetinkaya, C. (2022). The Attitude of ZnO/Al2O3 Film Produced by Ultrasonic Spray Pyrolysis Under Thermal Annealing. Gazi University Journal of Science Part C: Design and Technology, 10(4), 1026-1036. https://doi.org/10.29109/gujsc.1137863

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